SEMI PR7 : 2002
Superseded
Superseded
A superseded Standard is one, which is fully replaced by another Standard, which is a new edition of the same Standard.
View Superseded by
PROPOSED PHOTOMASK QUALIFICATION TERMINOLOGY
Superseded date
01-03-2004
Superseded by
Published date
12-01-2013
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Specifies a unique language in the field of specification for, and qualification of, photomasks for use in optical lithography within the semiconductor industry.
DevelopmentNote |
Not available for sale from ILI, customer to contact SEMI. (02/2003)
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DocumentType |
Standard
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PublisherName |
Semiconductor Equipment & Materials Institute
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Status |
Superseded
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SupersededBy |
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