SEMI T11 : 2003(R2014)
Current
Current
The latest, up-to-date edition.
SPECIFICATION FOR MARKING OF HARD SURFACE RETICLE SUBSTRATES
Published date
12-01-2013
Sorry this product is not available in your region.
Specifies a symbology for marking hard surface reticle substrates within the edge exclusion area of the substrate.
| DevelopmentNote |
Not available for sale from ILI, customer to contact SEMI. (06/2003)
|
| DocumentType |
Standard
|
| PublisherName |
Semiconductor Equipment & Materials Institute
|
| Status |
Current
|
| SEMI P1 : 2008E | SPECIFICATION FOR HARD SURFACE PHOTOMASK SUBSTRATES |
Access your standards online with a subscription
Features
-
Simple online access to standards, technical information and regulations.
-
Critical updates of standards and customisable alerts and notifications.
-
Multi-user online standards collection: secure, flexible and cost effective.