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SEMI T11 : 2003(R2014)

SEMI T11 : 2003(R2014)

Current

Current

The latest, up-to-date edition.

SPECIFICATION FOR MARKING OF HARD SURFACE RETICLE SUBSTRATES

Published date

12-01-2013

Publisher

Semiconductor Equipment & Materials Institute

Specifies a symbology for marking hard surface reticle substrates within the edge exclusion area of the substrate.

DevelopmentNote
Not available for sale from ILI, customer to contact SEMI. (06/2003)
DocumentType
Standard
PublisherName
Semiconductor Equipment & Materials Institute
Status
Current

SEMI P1 : 2008E SPECIFICATION FOR HARD SURFACE PHOTOMASK SUBSTRATES

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