UNI EN ISO 21068-3 : 2008
Current
The latest, up-to-date edition.
CHEMICAL ANALYSIS OF SILICON-CARBIDE CONTAINING RAW MATERIALS AND REFRACTORY PRODUCTS - PART 3: DETERMINATION OF NITROGEN, OXYGEN AND METALLIC AND OXIDIC CONSTITUENTS
04-12-2008
Foreword
Introduction
1 Scope
2 Normative references
3 Terms and definitions
4 Determination of nitrogen and oxygen
4.1 General
4.2 Combined determination of nitrogen and oxygen
by an analyser with thermal conductivity (CR)
and infrared absorption (IR) detection
5 Determination of nitrogen calculated as Si[3]N[4]
5.1 General
5.2 Acid decomposition - Titration method
5.3 Acid decomposition - Photometry method
5.4 Inert-gas fusion - Thermal conductivity method
5.5 Determination of total nitrogen
6 Determination of free Iron by Inductively Coupled
Plasma Atomic Emission Spectrometry (ICP-AES)
6.1 General
6.2 Copper sulphate method
6.3 Bromine/methanol method
7 Determination of free aluminium and free magnesium
7.1 General
7.2 Acid decomposition - Inductively coupled plasma
atomic emission spectroscopy (ICP-AES)
7.3 Acid decomposition - Flame Atomic Absorption
Spectrometry (FAAS)
7.4 Hydrogen generating method
8 Analysis of oxides
8.1 General
8.2 Wet methods
8.3 Flame atomic absorption and/or inductively
coupled plasma atomic emission spectrometer
8.4 XRF fusion method after ignition of the sample
8.5 Determination of silicon(IV) oxide, aluminium
oxide, iron(III) oxide, titanium(IV) oxide,
calcium oxide, magnesium oxide, sodium oxide,
potassium oxide, chromium(III) oxide, zirconium
oxide, and boron oxide
9 Expression of results
10 Test report
Annex A (informative) - Statistical results obtained
with analysis of refractories containing
carbon and/or silicon carbide
Bibliography
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