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  • SEMI E14 : 1993

    Withdrawn A Withdrawn Standard is one, which is removed from sale, and its unique number can no longer be used. The Standard can be withdrawn and not replaced, or it can be withdrawn and replaced by a Standard with a different number.

    MEASUREMENT OF PARTICLE CONTAMINATION CONTRIBUTED TO THE PRODUCT FROM THE PROCESS OR SUPPORT TOOL

    Available format(s): 

    Withdrawn date:  01-03-2003

    Language(s): 

    Published date:  12-01-2013

    Publisher:  Semiconductor Equipment & Materials Institute

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    Abstract - (Show below) - (Hide below)

    Covers, procedures, methods and application of a technique for the determination of average particle numbers added to a wafer when the wafer is passed through a semiconductor process tool. Providing a standardized methodology and procedure for the measurement of contamination performance of a particular tool or process in terms of the number and size distribution of particles added to a silicon wafer resulting from being passed through the process tool.

    General Product Information - (Show below) - (Hide below)

    Development Note Not available for sale from ILI, customer to contact SEMI. (05/2001)
    Document Type Standard
    Publisher Semiconductor Equipment & Materials Institute
    Status Withdrawn

    Standards Referenced By This Book - (Show below) - (Hide below)

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    16/30326493 DC : 0 BS EN ISO 14644-3 - CLEANROOMS AND ASSOCIATED CONTROLLED ENVIRONMENTS - PART 3: TEST METHODS
    01/121101 DC : DRAFT MAR 2001 BS EN ISO 14644-7 - CLEANROOMS AND ASSOCIATED CONTROLLED ENVIRONMENTS - PART 7: SEPARATIVE ENCLOSURES (CLEAN AIR HOODS, GLOVEBOXES, ISOLATORS, MINI-ENVIRONMENTS)
    BS EN ISO 14644-3:2005 Cleanrooms and associated controlled environments Test methods
    EN ISO 14644-3:2005 CLEANROOMS AND ASSOCIATED CONTROLLED ENVIRONMENTS - PART 3: TEST METHODS
    ISO 14644-3:2005 Cleanrooms and associated controlled environments Part 3: Test methods
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