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  • ASTM F 154 : 2002

    Withdrawn A Withdrawn Standard is one, which is removed from sale, and its unique number can no longer be used. The Standard can be withdrawn and not replaced, or it can be withdrawn and replaced by a Standard with a different number.

    Standard Guide for Identification of Structures and Contaminants Seen on Specular Silicon Surfaces (Withdrawn 2003)

    Available format(s):  Hardcopy, PDF

    Withdrawn date:  05-11-2013

    Language(s):  English

    Published date:  10-01-2001

    Publisher:  American Society for Testing and Materials

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    Abstract - (Show below) - (Hide below)

    CONTAINED IN VOL. 10.05, 2001 Lists, illustrates, and defines various characters, features, and contaminants seen on highly specular silicon, and gives recommended methods for observing these surface defects. Defects and common synonyms are arranged alphabetically using common name and most probable origins. Describes surfaces after mechanical and chemical polishing, and polished surfaces examined after epitaxial deposition.

    Scope - (Show below) - (Hide below)

    This standard was transferred to SEMI (www.semi.org) May 2003

    1.1 The purpose of this guide is to list, illustrate, and provide reference for various characteristic features and contaminants that are seen on highly specular silicon wafers. Recommended practices for delineation and observation of these artifacts are referenced. The artifacts described in this guide are intended to parallel and support the content of the SEMI M18. These artifacts and common synonyms are arranged alphabetically in Tables 1 and 2 and illustrated in Figs. 1-68 .

    General Product Information - (Show below) - (Hide below)

    Committee F 01
    Document Type Guide
    Publisher American Society for Testing and Materials
    Status Withdrawn
    Supersedes

    Standards Referenced By This Book - (Show below) - (Hide below)

    09/30207175 DC : 0 BS EN 62276 - SINGLE CRYSTAL WAFERS FOR SURFACE ACOUSTIC WAVE (SAW) DEVICE APPLICATIONS - SPECIFICATIONS AND MEASURING METHOD
    ASTM F 522 : 1994 Test Method for Stacking Fault Density of Epitaxial Layers of Silicon by Interference-Contrast Microscopy (Withdrawn 1998)

    Standards Referencing This Book - (Show below) - (Hide below)

    SEMI M18 : 2012 GUIDE FOR DEVELOPING SPECIFICATION FORMS FOR ORDER ENTRY OF SILICON WAFERS
    ASTM F 1241 : 1995 : R2000 Standard Terminology of Silicon Technology (Withdrawn 2003)
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