BS ISO 14701:2011
Withdrawn
A Withdrawn Standard is one, which is removed from sale, and its unique number can no longer be used. The Standard can be withdrawn and not replaced, or it can be withdrawn and replaced by a Standard with a different number.
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Surface chemical analysis. X-ray photoelectron spectroscopy. Measurement of silicon oxide thickness
Hardcopy , PDF
20-11-2018
English
31-08-2011
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Foreword
Introduction
1 Scope
2 Symbols and abbreviations
3 Outline of method
4 Method for measuring the oxide thickness
Bibliography
Describes several methods for measuring the oxide thickness at the surfaces of (100) and (111) silicon wafers as an equivalent thickness of silicon dioxide when measured using X-ray photoelectron spectroscopy.
| Committee |
CII/60
|
| DevelopmentNote |
Supersedes 10/30212265 DC. (08/2011)
|
| DocumentType |
Standard
|
| Pages |
24
|
| PublisherName |
British Standards Institution
|
| Status |
Withdrawn
|
| SupersededBy | |
| Supersedes |
| Standards | Relationship |
| ISO 14701:2011 | Identical |
| ISO 18116:2005 | Surface chemical analysis — Guidelines for preparation and mounting of specimens for analysis |
| ISO/TR 18392:2005 | Surface chemical analysis X-ray photoelectron spectroscopy Procedures for determining backgrounds |
| ISO/IEC Guide 98-3:2008 | Uncertainty of measurement — Part 3: Guide to the expression of uncertainty in measurement (GUM:1995) |
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