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BS ISO 14706:2014
Current
The latest, up-to-date edition.
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Surface chemical analysis. Determination of surface elemental contamination on silicon wafers by total-reflection X-ray fluorescence (TXRF) spectroscopy
Hardcopy , PDF
English
31-07-2014
Foreword
Introduction
1 Scope
2 Normative reference
3 Terms and definitions
4 Abbreviated terms
5 Principle
6 Apparatus
7 Environment for specimen preparation and measurement
8 Calibration reference materials
9 Safety
10 Measurement procedure
11 Expression of results
12 Precision
13 Test report
Annex A (informative) - Reference materials
Annex B (informative) - Relative sensitivity factor
Annex C (informative) - Preparation of reference materials
Annex D (informative) - VPD-TXRF method
Annex E (informative) - Glancing-angle settings
Annex F (informative) - International inter-laboratory test
results
Bibliography
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