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CEI EN 62047-18 : 2014

Current

Current

The latest, up-to-date edition.

SEMICONDUCTOR DEVICES - MICRO-ELECTROMECHANICAL DEVICES - PART 18: BEND TESTING METHODS OF THIN FILM MATERIALS

Available format(s)

Hardcopy , PDF

Language(s)

English

Published date

01-01-2014

FOREWORD
1 Scope
2 Normative references
3 Symbols and designations
4 Test piece
5 Testing method
6 Test report
Annex A (informative) - Precautions for the test piece
        substrate interface
Annex B (informative) - Precautions necessary for the
        force displacement relationship
Annex ZA (normative) - Normative references to
         international publications with their
         corresponding European publications

Describes the method for bend testing of thin film materials with a length and width under 1 mm and a thickness in the range between 0,1 [mu]m and 10 [mu]m.

Committee
CT 309
DevelopmentNote
Classificazione CEI 47-115. (05/2014)
DocumentType
Standard
Pages
20
PublisherName
Comitato Elettrotecnico Italiano
Status
Current

Standards Relationship
EN 62047-18:2013 Identical
IEC 62047-18:2013 Identical

EN 62047-6:2010 Semiconductor devices - Micro-electromechanical devices - Part 6: Axial fatigue testing methods of thin film materials
IEC 62047-6:2009 Semiconductor devices - Micro-electromechanical devices - Part 6: Axial fatigue testing methods of thin film materials

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