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IPC MS 810 : 0

Current

Current

The latest, up-to-date edition.

GUIDELINES FOR HIGH VOLUME MICROSECTION

Available format(s)

Hardcopy

Language(s)

English

Published date

01-10-1993

1 SCOPE
2 APPLICABLE DOCUMENTS
   2.1 IPC
3 SAMPLE REMOVAL PROCESS
   3.1 Sample Location
   3.2 Removal Method
4 MOUNT PROCESS
   4.1 Sample Orientation
   4.2 Tooling System
   4.3 Mounting
   4.4 Mount Process Quality
5 GRIND PROCESS
   5.1 Equipment
   5.2 Tooling
   5.3 Tool Stops
   5.4 Consumables
   5.5 Grind Process Quality
6 POLISH PROCESS
   6.1 Equipment
   6.2 Tooling
   6.3 Consumables
   6.4 Cleanliness
   6.5 Polish Process Quality
7 MICRO-ETCHING
   7.1 Application Methods
   7.2 Types
8 TROUBLESHOOT GUIDE
9 GLOSSARY
   9.1 Abrasion
   9.2 Charging
   9.3 Coupon Test Strip
   9.4 Crescent Moon Scratch
   9.5 Grind
   9.6 Grinding Wheel
   9.7 Grit Size
   9.8 Grind Mount Holder
   9.9 Micro Etchant
   9.10 Mounting
   9.11 Polish Mount Holder
   9.12 Polish
   9.13 Sample Removal
   9.14 Scratch
   9.15 Scratch Trace
   9.16 Speed Bump
   9.17 Stops, Tooling
   9.18 Target Plated-Through Hole
   9.19 Tooling Edge, Mount
   9.20 Tooling Holes, Microsection
   9.21 Tooling Pins, Microsection
10 REFERENCES
11 RECOMMENDED READING
12 ILLUSTRATIONS

Discuss the many variables and problems associated with the process from sample removal to micro-etch. The guidelines discuss the variables common to high volume microsection. The process variables and problems are organized so the reader can research a specific issue or overview the variables of a process area.

DevelopmentNote
Included in IPC C 105 & IPC C 1000. (08/2008)
DocumentType
Standard
Pages
21
PublisherName
Institute of Printed Circuits
Status
Current

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