ISO/TR 22335:2007
Current
The latest, up-to-date edition.
Surface chemical analysis Depth profiling Measurement of sputtering rate: mesh-replica method using a mechanical stylus profilometer
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English, French
02-07-2007
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ISO/TR 22335:2007 describes a method for determining ion-sputtering rates for depth profiling measurements with Auger electron spectroscopy (AES) and Xray photoelectron spectroscopy (XPS) where the specimen is ion-sputtered over a region with an area between 0,4 mm2 and 3,0 mm2. The Technical Report is applicable only to a laterally homogeneous bulk or single-layered material where the ion-sputtering rate is determined from the sputtered depth, as measured by a mechanical stylus profilometer, and sputtering time.
The Technical Report provides a method to convert the ion-sputtering time scale to sputtered depth in a depth profile by assuming a constant sputtering velocity. This method has not been designed for, or tested using, a scanning probe microscope system. It is not applicable to the case where the sputtered area is less than 0,4 mm2 or where the sputter-induced surface roughness is significant compared with the sputtered depth to be measured.
| DevelopmentNote |
Supersedes ISO/DIS 22335. (07/2007)
|
| DocumentType |
Technical Report
|
| Pages |
18
|
| PublisherName |
International Organization for Standardization
|
| Status |
Current
|
| Standards | Relationship |
| NEN NPR ISO/TR 22335 : 2007 | Identical |
| PD ISO/TR 22335:2007 | Identical |
| FD ISO/TR 22335 : 2008 FD | Identical |
| SAC GB/T 32999 : 2016 | Identical |
| BS ISO 10810:2010 | Surface chemical analysis. X-ray photoelectron spectroscopy. Guidelines for analysis |
| ASTM E 1127 : 2008 : R2015 | Standard Guide for Depth Profiling in Auger Electron Spectroscopy (Withdrawn 2024) |
| ISO 10810:2010 | Surface chemical analysis X-ray photoelectron spectroscopy Guidelines for analysis |
| ASTM E 2735 : 2014 : REDLINE | Standard Guide for Selection of Calibrations Needed for X-ray Photoelectron Spectroscopy (XPS) Experiments |
| PD ISO/TR 14187:2011 | Surface chemical analysis. Characterization of nanostructured materials |
| ASTM E 1127 : 2008 | Standard Guide for Depth Profiling in Auger Electron Spectroscopy |
| 09/30191895 DC : 0 | BS ISO 10810 - SURFACE CHEMICAL ANALYSIS - X-RAY PHOTOELECTRON SPECTROSCOPY - GUIDELINES FOR ANALYSIS |
| ISO/TR 14187:2011 | Surface chemical analysis Characterization of nanostructured materials |
| ISO 12179:2000 | Geometrical Product Specifications (GPS) Surface texture: Profile method Calibration of contact (stylus) instruments |
| ISO 13565-3:1998 | Geometrical Product Specifications (GPS) Surface texture: Profile method; Surfaces having stratified functional properties Part 3: Height characterization using the material probability curve |
| ASME B46.1 : 2009 | SURFACE TEXTURE (SURFACE ROUGHNESS, WAVINESS, AND LAY) |
| ISO/TR 15969:2001 | Surface chemical analysis Depth profiling Measurement of sputtered depth |
| ISO 14606:2015 | Surface chemical analysis — Sputter depth profiling — Optimization using layered systems as reference materials |
| ISO 18115:2001 | Surface chemical analysis Vocabulary |
| ISO 5436-1:2000 | Geometrical Product Specifications (GPS) — Surface texture: Profile method; Measurement standards — Part 1: Material measures |
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