PD IEC/TS 62622:2012
Current
The latest, up-to-date edition.
Nanotechnologies. Description, measurement and dimensional quality parameters of artificial gratings
Hardcopy , PDF
English
28-02-2013
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FOREWORD
INTRODUCTION
1 Scope
2 Normative references
3 Terms and definitions
4 Symbols and abbreviated terms
5 Grating calibration and quality characterization methods
6 Reporting of grating characterization results
Annex A (informative) - Background information and examples
Annex B (informative) - Bravais lattices
Bibliography
Defines the generic terminology for the global and local quality parameters of artificial gratings, interpreted in terms of deviations from nominal positions of grating features, and provides guidance on the categorization of measurement and evaluation methods for their determination.
| Committee |
NTI/1
|
| DocumentType |
Standard
|
| Pages |
44
|
| PublisherName |
British Standards Institution
|
| Status |
Current
|
This technical specification specifies the generic terminology for the global and local quality parameters of artificial gratings, interpreted in terms of deviations from nominal positions of grating features, and provides guidance on the categorization of measurement and evaluation methods for their determination.
This specification is intended to facilitate communication among manufacturers, users and calibration laboratories dealing with the characterization of the dimensional quality parameters of artificial gratings used in nanotechnology.
This specification supports quality assurance in the production and use of artificial gratings in different areas of application in nanotechnology. Whilst the definitions and described methods are universal to a large variety of different gratings, the focus is on one-dimensional (1D) and two-dimensional (2D) gratings.
| Standards | Relationship |
| IEC TS 62622:2012 | Identical |
| ISO 16700:2016 | Microbeam analysis — Scanning electron microscopy — Guidelines for calibrating image magnification |
| ISO/IEC 17025:2005 | General requirements for the competence of testing and calibration laboratories |
| ISO 15902:2004 | Optics and photonics Diffractive optics Vocabulary |
| ISO 29301:2010 | Microbeam analysis Analytical transmission electron microscopy Methods for calibrating image magnification by using reference materials having periodic structures |
| GOST R 8-631 : 2007 AMD 1 2011 | STATE SYSTEM FOR ENSURING THE UNIFORMITY OF MEASUREMENTS - SCANNING ELECTRON MEASURING MICROSCOPES - METHODS FOR VERIFICATION |
| GOST R 8-630 : 2007 AMD 1 2011 | STATE SYSTEM FOR ENSURING THE UNIFORMITY OF MEASUREMENTS - ATOMIC-FORCE SCANNING PROBE MEASURING MICROSCOPES - METHODS FOR VERIFICATION |
| GOST R 8-635 : 2007 | STATE SYSTEM FOR ENSURING THE UNIFORMITY OF MEASUREMENTS - ATOMIC-FORCE SCANNING PROBE MICROSCOPES - METHOD FOR CALIBRATION |
| ISO/TS 80004-1:2015 | Nanotechnologies — Vocabulary — Part 1: Core terms |
| OIML R 98 : 1991 | HIGH-PRECISION LINE MEASURES OF LENGTH |
| ISO/TS 16610-1:2006 | Geometrical product specifications (GPS) Filtration Part 1: Overview and basic concepts |
| ISO 14660-1:1999 | Geometrical Product Specifications (GPS) Geometrical features Part 1: General terms and definitions |
| SEMI P35 : 2006(R2013) | TERMINOLOGY FOR MICROLITHOGRAPHY METROLOGY |
| GOST R 8-628 : 2007 AMD 1 2011 | STATE SYSTEM FOR ENSURING THE UNIFORMITY OF MEASUREMENTS - SINGLE-CRYSTAL SILICON NANOMETER RANGE RELIEF MEASURES - REQUIREMENTS FOR GEOMETRICAL SHAPES, LINEAR SIZES AND MANUFACTURING MATERIAL SELECTION |
| GOST R 8-644 : 2008 | STATE SYSTEM FOR ENSURING THE UNIFORMITY OF MEASUREMENTS - NANOMETER RANGE RELIEF MEASURES WITH TRAPEZOIDAL PROFILE OF ELEMENTS - METHODS FOR CALIBRATION |
| GOST R 8-629 : 2007 AMD 1 2011 | STATE SYSTEM FOR ENSURING THE UNIFORMITY OF MEASUREMENTS - NANOMETER RANGE RELIEF MEASURES WITH TRAPEZOIDAL PROFILE OF ELEMENTS - METHODS FOR VERIFICATION |
| GOST R 8-636 : 2007 | STATE SYSTEM FOR ENSURING THE UNIFORMITY OF MEASUREMENTS - SCANNING ELECTRON MICROSCOPES - METHODS FOR CALIBRATION |
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