SEMI C10.1 : 1994
Superseded
A superseded Standard is one, which is fully replaced by another Standard, which is a new edition of the same Standard.
View Superseded by
GUIDE FOR DETERMINATION OF METHOD DETECTION LIMITS FOR TRACE METAL ANALYSIS BY PLASMA SPECTROSCOPY
01-03-2005
12-01-2013
NOTE: This document was previously designated SEMI C10. Because it is a subdocument, its designation has been reassigned for ease of reference. This document is intended to provide specific procedure for the quantitative determination of the Method Detection Limit (MDL) for the analysis of trace metals by plasma spectroscopy for SEMI-specified process chemicals. Plasma Spectroscopy methods used to determine the level of trace metal impurities in SEMI- specified chemicals are based on the use of a calibration curve relating signal intensity to analyte concentration. Guide gives both a method for determining an MDL and for setting its maximum acceptable level.
| DevelopmentNote |
Not available for sale from ILI, customer to contact SEMI. No longer available separately, included in SEMI C10. (02/2005)
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| DocumentType |
Standard
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| PublisherName |
Semiconductor Equipment & Materials Institute
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| Status |
Superseded
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| SupersededBy |
| SEMI M33 : 1998 | TEST METHOD FOR THE DETERMINATION OF RESIDUAL SURFACE CONTAMINATION ON SILICON WAFERS BY MEANS OF TOTAL REFLECTION X-RAY FLUORESCENCE SPECTROSCOPY (TXRF) |
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