
SEMI C19 : 2014
Current
Current
The latest, up-to-date edition.

SPECIFICATION FOR ACETONE
Published date
12-01-2013
Standardizes requirements for acetone used in the semiconductor industry and testing procedures to support those standards. Test methods have been shown in to give statistically valid results.
DevelopmentNote |
Not available for sale from ILI, customer to contact SEMI. (05/2001) Supersedes SEMI C1.2. (03/2005)
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DocumentType |
Standard
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PublisherName |
Semiconductor Equipment & Materials Institute
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Status |
Current
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Supersedes |
SEMI MF397 : 2006(R2011) | TEST METHOD FOR RESISTIVITY OF SILICON BARS USING A TWO-POINT PROBE |
SEMI MF1529 : 2010(R2015) | TEST METHOD FOR SHEET RESISTANCE UNIFORMITY EVALUATION BY IN-LINE FOUR-POINT PROBE WITH THE DUAL-CONFIGURATION PROCEDURE |
SEMI MF374 :2012(R2018) | TEST METHOD FOR SHEET RESISTANCE OF SILICON EPITAXIAL, DIFFUSED, POLYSILICON, AND ION-IMPLANTED LAYERS USING AN IN-LINE FOUR-POINT PROBE WITH THE SINGLE-CONFIGURATION PROCEDURE |
SEMI MF84:2012 | TEST METHOD FOR MEASURING RESISTIVITY OF SILICON WAFERS WITH AN IN-LINE FOUR-POINT PROBE |
SEMI MF576 -2012:(R2018) | TEST METHOD FOR MEASUREMENT OF INSULATOR THICKNESS AND REFRACTIVE INDEX ON SILICON SUBSTRATES BY ELLIPSOMETRY |
ASTM F 576 : 2001 | Standard Test Method for Measurement of Insulator Thickness and Refractive Index on Silicon Substrates by Ellipsometry (Withdrawn 2003) |
SEMI C44 : 2014 | SPECIFICATIONS AND GUIDELINES FOR SULFURIC ACID |
SEMI C1 : 2010 | GUIDE FOR THE ANALYSIS OF LIQUID CHEMICALS |
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