SEMI C93 : 2017
Superseded
Superseded
A superseded Standard is one, which is fully replaced by another Standard, which is a new edition of the same Standard.
View Superseded by
GUIDE FOR DETERMINING THE QUALITY OF ION EXCHANGE RESIN USED IN POLISH APPLICATIONS OF ULTRAPURE WATER SYSTEM
Superseded date
05-10-2020
Superseded by
Published date
08-03-2016
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Specifies a Guide for analysis of virgin high-purity ion exchange (HPIX) resin suitable for use in ultrapure water (UPW) polish applications.
| DevelopmentNote |
Not available for sale from ILI, customer to contact SEMI. (02/2016)
|
| DocumentType |
Standard
|
| PublisherName |
Semiconductor Equipment & Materials Institute
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| Status |
Superseded
|
| SupersededBy |
| SEMI F63 : 2016 | GUIDE FOR ULTRAPURE WATER USED IN SEMICONDUCTOR PROCESSING |
| SEMI E49 : 2017 | GUIDE FOR HIGH PURITY AND ULTRAHIGH PURITY PIPING PERFORMANCE, SUBASSEMBLIES, AND FINAL ASSEMBLIES |
| SEMI S2 : 2016B | ENVIRONMENTAL, HEALTH, AND SAFETY GUIDELINE FOR SEMICONDUCTOR MANUFACTURING EQUIPMENT |
| SEMI F63 : 2016 | GUIDE FOR ULTRAPURE WATER USED IN SEMICONDUCTOR PROCESSING |
| SEMI F40-0699E(R2018) | PRACTICE FOR PREPARING LIQUID CHEMICAL DISTRIBUTION COMPONENTS FOR CHEMICAL TESTING |
| SEMI F61 : 2017 | GUIDE TO DESIGN AND OPERATION OF A SEMICONDUCTOR ULTRAPURE WATER SYSTEM |
| SEMI F104 : 2012 | PARTICLE TEST METHOD GUIDE FOR EVALUATION OF COMPONENTS USED IN ULTRAPURE WATER AND LIQUID CHEMICAL DISTRIBUTION SYSTEMS |
| SEMI F57 : 2014 | SPECIFICATION FOR POLYMER MATERIALS AND COMPONENTS USED IN ULTRA PURE WATER AND LIQUID CHEMICAL DISTRIBUTION SYSTEMS |
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