SEMI M3 : 2004
Withdrawn
A Withdrawn Standard is one, which is removed from sale, and its unique number can no longer be used. The Standard can be withdrawn and not replaced, or it can be withdrawn and replaced by a Standard with a different number.
SPECIFICATIONS FOR POLISHED MONOCRYSTALLINE SAPPHIRE SUBSTRATES
01-07-2007
12-01-2013
This group of specifications cover the requirements in general for a range of 4 sizes of monocrystalline high-purity polished sapphire substrates that are used for silicon growth and ensuing semiconductor device manufacture. The Subordinate Documents include: M3.2 Standard for 2 inch Sapphire Substrates, M3.4 Standard for 3 inch Sapphire Substrates, M3.5 Standard for 100 mm Sapphire Substrates, M3.6 Standard for 3 inch Reclaimed Sapphire Substrates, M3.7 Standard for 125 mm Sapphire Substrates, M3.8 Standard for 150 mm Sapphire Substrates.
| DevelopmentNote |
Not available for sale from ILI, customer to contact SEMI. (05/2001) Supersedes SEMI M3.2, M3.4, M3.5, M3.6, M3.7, and M3.8. (02/2004)
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| DocumentType |
Standard
|
| PublisherName |
Semiconductor Equipment & Materials Institute
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| Status |
Withdrawn
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| SEMI M4 : NOV 2003 | SPECIFICATIONS FOR SOS EPITAXIAL WAFERS |
| ASTM F 2358 : 2004 | Standard Guide for Measuring Characteristics of Sapphire Substrates |
| SEMI M65 : 2016 | SPECIFICATION FOR SAPPHIRE SUBSTRATES TO USE FOR COMPOUND SEMICONDUCTOR EPITAXIAL WAFERS |
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| SEMI MF928 : 2017 | TEST METHOD FOR EDGE CONTOUR OF CIRCULAR SEMICONDUCTOR WAFERS AND RIGID DISK SUBSTRATES |
| SEMI MF534 : 2007 | TEST METHOD FOR BOW OF SILICON WAFERS |
| SEMI MF2074 : 2012 (R2018) | GUIDE FOR MEASURING DIAMETER OF SILICON AND OTHER SEMICONDUCTOR WAFERS |
| SEMI MF1810 : 2010(R2015) | TEST METHOD FOR COUNTING PREFERENTIALLY ETCHED OR DECORATED SURFACE DEFECTS IN SILICON WAFERS |
| SEMI MF523 : 2007(R2018) | PRACTICE FOR UNAIDED VISUAL INSPECTION OF POLISHED SILICON WAFER SURFACES |
| SEMI MF847 : 2016 | TEST METHOD FOR MEASURING CRYSTALLOGRAPHIC ORIENTATION OF FLATS ON SINGLE CRYSTAL SILICON WAFERS BY X-RAY TECHNIQUES |
| SEMI MF671:2012 | TEST METHOD FOR MEASURING FLAT LENGTH ON WAFERS OF SILICON AND OTHER ELECTRONIC MATERIALS |
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