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SEMI M50 : 2016

Current

Current

The latest, up-to-date edition.

TEST METHOD FOR DETERMINING CAPTURE RATE AND FALSE COUNT RATE FOR SURFACE SCANNING INSPECTION SYSTEMS BY THE OVERLAY METHOD

Published date

12-01-2013

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Specifies capture rate (CR) requirements to be met by a scanning surface inspection system (SSIS) to be used for silicon wafers spanning several semiconductor technology generations.

DevelopmentNote
Not available for sale from ILI, customer to contact SEMI. (11/2001)
DocumentType
Standard
PublisherName
Semiconductor Equipment & Materials Institute
Status
Current

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