SEMI M50 : 2016
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TEST METHOD FOR DETERMINING CAPTURE RATE AND FALSE COUNT RATE FOR SURFACE SCANNING INSPECTION SYSTEMS BY THE OVERLAY METHOD
Published date
12-01-2013
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Specifies capture rate (CR) requirements to be met by a scanning surface inspection system (SSIS) to be used for silicon wafers spanning several semiconductor technology generations.
DevelopmentNote |
Not available for sale from ILI, customer to contact SEMI. (11/2001)
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DocumentType |
Standard
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PublisherName |
Semiconductor Equipment & Materials Institute
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Status |
Current
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