SEMI M53 : 2018
Superseded
A superseded Standard is one, which is fully replaced by another Standard, which is a new edition of the same Standard.
View Superseded by
PRACTICE FOR CALIBRATING SCANNING SURFACE INSPECTION SYSTEMS USING CERTIFIED DEPOSITIONS OF MONODISPERE REFERENCE SPHERES ON UNPATTERNED SEMICONDUCTOR WAFER SURFACES
02-03-2019
12-01-2013
Specifies calibration of scanning surface inspection system (SSIS) dark field detector channels so that the SSIS will accurately size polystyrene latex (PSL) spheres deposited on unpatterned polished, epitaxial, or filmed semiconductor wafer surfaces.
| DevelopmentNote |
Not available for sale from ILI, customer to contact SEMI. (02/2003)
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| DocumentType |
Standard
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| PublisherName |
Semiconductor Equipment & Materials Institute
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| Status |
Superseded
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| SupersededBy |
| SEMI M59 : 2014 | TERMINOLOGY FOR SILICON TECHNOLOGY |
| SEMI M58 : 2009(R2014) | TEST METHOD FOR EVALUATING DMA BASED PARTICLE DEPOSITION SYSTEMS AND PROCESSES |
| SEMI M20 : 2015 | PRACTICE FOR ESTABLISHING A WAFER COORDINATE SYSTEM |
| SEMI M50 : 2016 | TEST METHOD FOR DETERMINING CAPTURE RATE AND FALSE COUNT RATE FOR SURFACE SCANNING INSPECTION SYSTEMS BY THE OVERLAY METHOD |
| SEMI M52 : 2014 | GUIDE FOR SPECIFYING SCANNING SURFACE INSPECTION SYSTEMS FOR SILICON WAFERS FOR THE 130 NM TO 11 NM TECHNOLOGY GENERATIONS |
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