SEMI M61:2012(R2023)
Current
Current
The latest, up-to-date edition.
Specification for Silicon Epitaxial Wafers with Buried Layers
Available format(s)
Hardcopy
Language(s)
English
Published date
01-10-2023
This Specification defines the properties of silicon epitaxial wafers with buried layers that relate to the characteristics of photolithography, buried layer, and buried layer pattern after the deposition of the epitaxial layer.
DocumentType |
Standard
|
Pages |
0
|
PublisherName |
Semiconductor Equipment & Materials Institute
|
Status |
Current
|
Supersedes |
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