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SEMI M61 : 2007(R 2019)

Superseded

Superseded

A superseded Standard is one, which is fully replaced by another Standard, which is a new edition of the same Standard.

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superseded

A superseded Standard is one, which is fully replaced by another Standard, which is a new edition of the same Standard.

SPECIFICATION FOR SILICON EPITAXIAL WAFERS WITH BURIED LAYERS

Available format(s)

Hardcopy

Superseded date

16-11-2023

Language(s)

English

Published date

12-01-2013

Describes the properties of silicon epitaxial wafers with buried layers that relate to the characteristics of photolithography, buried layer, and buried layer pattern after the deposition of the epitaxial layer.

DevelopmentNote
Not available for sale from ILI, customer to contact SEMI. (07/2005) Also available in CD-ROM. (02/2007)
DocumentType
Revision
Pages
0
PublisherName
Semiconductor Equipment & Materials Institute
Status
Superseded
SupersededBy

SEMI M1 : 2017 SPECIFICATION FOR POLISHED SINGLE CRYSTAL SILICON WAFERS
SEMI M18 : 2012 GUIDE FOR DEVELOPING SPECIFICATION FORMS FOR ORDER ENTRY OF SILICON WAFERS
SEMI M32 : 2007 GUIDE TO STATISTICAL SPECIFICATIONS

SEMI M59 : 2014 TERMINOLOGY FOR SILICON TECHNOLOGY
SEMI M18 : 2012 GUIDE FOR DEVELOPING SPECIFICATION FORMS FOR ORDER ENTRY OF SILICON WAFERS
SEMI M20 : 2015 PRACTICE FOR ESTABLISHING A WAFER COORDINATE SYSTEM
SEMI M2 : 2003 SPECIFICATION FOR SILICON EPITAXIAL WAFERS FOR DISCRETE DEVICE APPLICATIONS

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