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SEMI M61:2012(R2023)

Current

Current

The latest, up-to-date edition.

Specification for Silicon Epitaxial Wafers with Buried Layers

Available format(s)

Hardcopy

Language(s)

English

Published date

01-10-2023

This Specification defines the properties of silicon epitaxial wafers with buried layers that relate to the characteristics of photolithography, buried layer, and buried layer pattern after the deposition of the epitaxial layer.

DocumentType
Standard
Pages
0
PublisherName
Semiconductor Equipment & Materials Institute
Status
Current
Supersedes

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€158.61
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