SEMI M69 : 2007
Current
Current
The latest, up-to-date edition.
PRACTICE FOR DETERMINING WAFER NEAR-EDGE GEOMETRY USING ROLL-OFF AMOUNT, ROA
Published date
12-01-2013
Sorry this product is not available in your region.
Describes selection of the point at which the ROA is determined and the reference line to be utilized for this determination.
DevelopmentNote |
Not available for sale from ILI, customer to contact SEMI. Also available in CD-ROM. (02/2007)
|
DocumentType |
Standard
|
PublisherName |
Semiconductor Equipment & Materials Institute
|
Status |
Current
|
SEMI M59 : 2014 | TERMINOLOGY FOR SILICON TECHNOLOGY |
SEMI M20 : 2015 | PRACTICE FOR ESTABLISHING A WAFER COORDINATE SYSTEM |
Access your standards online with a subscription
Features
-
Simple online access to standards, technical information and regulations.
-
Critical updates of standards and customisable alerts and notifications.
-
Multi-user online standards collection: secure, flexible and cost effective.