SEMI M72 : 2008
Current
Current
The latest, up-to-date edition.
TEST METHOD FOR DETERMINING WAFER FLATNESS USING THE MOVING AVERAGE QUALIFICATION METRIC BASED ON SCANNING LITHOGRAPHY
Published date
12-01-2013
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Covers determination of MA data arrays as well as wafer qualification quantities (one number per wafer or wafer area) derived from these arrays.
DevelopmentNote |
Not available for sale from ILI, customer to contact SEMI. Also available in CD-ROM. (03/2008)
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DocumentType |
Standard
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PublisherName |
Semiconductor Equipment & Materials Institute
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Status |
Current
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SEMI M59 : 2014 | TERMINOLOGY FOR SILICON TECHNOLOGY |
SEMI MF1530 : 2007(R2018) | TEST METHOD FOR MEASURING FLATNESS, THICKNESS, AND TOTAL THICKNESS VARIATION ON SILICON WAFERS BY AUTOMATED NON-CONTACT SCANNING |
SEMI M20 : 2015 | PRACTICE FOR ESTABLISHING A WAFER COORDINATE SYSTEM |
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