SEMI M85 : 2014
Superseded
Superseded
A superseded Standard is one, which is fully replaced by another Standard, which is a new edition of the same Standard.
View Superseded by
GUIDE FOR THE MEASUREMENT OF TRACE METAL CONTAMINATION ON SILICON WAFER SURFACE BY INDUCTIVELY COUPLED PLASMA MASS SPECTROMETRY
Superseded date
05-10-2020
Superseded by
Published date
02-12-2014
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Specifies the procedure for trace metal measurement, including the metal impurity collection method from a silicon wafer surface, scanning solution composition, and its optimization.
| DevelopmentNote |
Not available for sale from ILI, customer to contact SEMI. (11/2014)
|
| DocumentType |
Standard
|
| PublisherName |
Semiconductor Equipment & Materials Institute
|
| Status |
Superseded
|
| SupersededBy |
| SEMI M1 : 2017 | SPECIFICATION FOR POLISHED SINGLE CRYSTAL SILICON WAFERS |
| SEMI E45 : NOV 2001(R2007) | TEST METHOD FOR THE DETERMINATION OF INORGANIC CONTAMINATION FROM MINIENVIRONMENTS USING VAPOR PHASE DECOMPOSITION-TOTAL REFLECTION X-RAY SPECTROSCOPY (VPD-TXRF) AND VAPOR PHASE DECOMPOSITION-ATOMIC ABSORPTION SPECTROSCOPY (VPD/ICP-MS) |
| SEMI C1 : 2010 | GUIDE FOR THE ANALYSIS OF LIQUID CHEMICALS |
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