SEMI MF1724 : 2004
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TEST METHOD FOR MEASURING SURFACE METAL CONTAMINATION OF POLYCRYSTALLINE SILICON BY ACID EXTRACTION-ATOMIC ABSORPTION SPECTROSCOPY
Published date
12-01-2013
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Describes the quantitative determination of surface trace metal contamination on the surface of polycrystalline silicon chunks using an acid to extract the metals from the surface.
| DevelopmentNote |
Not available for sale from ILI, customer to contact SEMI. (10/2004)
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| DocumentType |
Standard
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| PublisherName |
Semiconductor Equipment & Materials Institute
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| Status |
Current
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| SEMI PV1 : 2011(R2018) | TEST METHOD FOR MEASURING TRACE ELEMENTS IN SILICON FEEDSTOCK FOR SILICON SOLAR CELLS BY HIGH-MASS RESOLUTION GLOW DISCHARGE MASS SPECTROMETRY |
| SEMI PV49 : 2013(R2018) | TEST METHOD FOR THE MEASUREMENT OF ELEMENTAL IMPURITY CONCENTRATIONS IN SILICON FEEDSTOCK FOR SILICON SOLAR CELLS BY BULK DIGESTION, INDUCTIVELY COUPLED-PLASMA MASS SPECTROMETRY |
| SEMI M16 : 2010(R2015) | SPECIFICATION FOR POLYCRYSTALLINE SILICON |
| SEMI C28 : 2011 | SPECIFICATIONS FOR HYDROFLUORIC ACID |
| SEMI M16 : 2010(R2015) | SPECIFICATION FOR POLYCRYSTALLINE SILICON |
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