SEMI MF2166 : 2010
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The latest, up-to-date edition.
PRACTICES FOR MONITORING NON-CONTACT DIELECTRIC CHARACTERIZATION SYSTEMS THROUGH USE OF SPECIAL REFERENCE WAFERS
Published date
12-01-2013
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Specifies procedures for testing these systems with the use of special reference wafers with specified characteristics. The procedures in these practices are designed to ensure that the NCDCS being evaluated provides reliable data for selected device-related parameters.
| DevelopmentNote |
Not available for sale from ILI, customer to contact SEMI. (02/2004)
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| DocumentType |
Standard
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| PublisherName |
Semiconductor Equipment & Materials Institute
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| Status |
Current
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| SEMI M59 : 2014 | TERMINOLOGY FOR SILICON TECHNOLOGY |
| SEMI M20 : 2015 | PRACTICE FOR ESTABLISHING A WAFER COORDINATE SYSTEM |
| SEMI MF1153 : 2010(R2015) | TEST METHOD FOR CHARACTERIZATION OF METAL-OXIDE SILICON (MOS) STRUCTURES BY CAPACITANCE-VOLTAGE MEASUREMENTS |
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