SEMI P2 : 2008
Current
Current
The latest, up-to-date edition.
SPECIFICATION FOR CHROME THIN FILMS FOR HARD SURFACE PHOTOMASKS
Published date
12-01-2013
Sorry this product is not available in your region.
Describes the general requirements of the chrome thin film for hard surface photomasks.
| DevelopmentNote |
Not available for sale from ILI, customer to contact SEMI. (05/2001) Also available in CD-ROM. (03/2008)
|
| DocumentType |
Standard
|
| PublisherName |
Semiconductor Equipment & Materials Institute
|
| Status |
Current
|
| SEMI P29 : 2011 | SPECIFICATION FOR CHARACTERISTICS SPECIFIC TO ATTENUATED PHASE SHIFT MASKS AND MASKS BLANKS |
| SEMI P10 : 2012 | SPECIFICATION OF DATA STRUCTURES FOR PHOTOMASK ORDERS |
| SEMI P3 : 2008 | SPECIFICATION FOR PHOTORESIST/E-BEAM RESIST FOR HARD SURFACE PHOTOPLATES |
| SEMI P1 : 2008E | SPECIFICATION FOR HARD SURFACE PHOTOMASK SUBSTRATES |
Access your standards online with a subscription
Features
-
Simple online access to standards, technical information and regulations.
-
Critical updates of standards and customisable alerts and notifications.
-
Multi-user online standards collection: secure, flexible and cost effective.