SEMI P21 : 1992(R2003)
Current
Current
The latest, up-to-date edition.
GUIDELINES FOR PRECISION AND ACCURACY EXPRESSION FOR MASK WRITING EQUIPMENT
Published date
12-01-2013
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Describes general requirements concerning accuracy and precision expression of mask writing equipment. Writing accuracy of the mask writing equipment is evaluated by measuring a written mask, and is affected greatly by process conditions to be carried out. Thus, the writing conditions are to be agreed upon by the user and the maker.
| DevelopmentNote |
Not available for sale from ILI, customer to contact SEMI. (05/2001)
|
| DocumentType |
Standard
|
| PublisherName |
Semiconductor Equipment & Materials Institute
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| Status |
Current
|
| Standards | Relationship |
| SAC GB/T 16879 : 1997 | Identical |
| BS IEC 62899-301-2:2017 | Printed electronics Equipment. Contact printing. Rigid master. Measurement method of plate master pattern dimension |
| SEMI P10 : 2012 | SPECIFICATION OF DATA STRUCTURES FOR PHOTOMASK ORDERS |
| SEMI P43 : 2004(R2011) | PHOTOMASK QUALIFICATION TERMINOLOGY |
| 14/30317965 DC : 0 | BS EN 62903-2 ED.1 - PRINTED ELECTRONICS - EQUIPMENT - CONTACT PRINTING - RIGID MASTER - PART 2: MEASUREMENT METHOD OF PLATE MASTER PATTERN DIMENSION |
| IEC 62899-301-2:2017 | Printed electronics - Part 301-2: Equipment - Contact printing - Rigid master - Measurement method of plate master pattern dimension |
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