SEMI P29 : 2011
Current
Current
The latest, up-to-date edition.
SPECIFICATION FOR CHARACTERISTICS SPECIFIC TO ATTENUATED PHASE SHIFT MASKS AND MASKS BLANKS
Published date
12-01-2013
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Specifies the characteristics specific to attenuated phase shift masks and mask blanks.
| DevelopmentNote |
Not available for sale from ILI, customer to contact SEMI. (05/2001)
|
| DocumentType |
Standard
|
| PublisherName |
Semiconductor Equipment & Materials Institute
|
| Status |
Current
|
| SEMI P10 : 2012 | SPECIFICATION OF DATA STRUCTURES FOR PHOTOMASK ORDERS |
| SEMI P28 : 1996(R2007) | SPECIFICATION FOR OVERLAY-METROLOGY TEST PATTERNS FOR INTEGRATED-CIRCUIT MANUFACTURE |
| SEMI P2 : 2008 | SPECIFICATION FOR CHROME THIN FILMS FOR HARD SURFACE PHOTOMASKS |
| SEMI P22 : 2007 | GUIDELINE FOR PHOTOMASK DEFECT CLASSIFICATION AND SIZE DEFINITION |
| SEMI P1 : 2008E | SPECIFICATION FOR HARD SURFACE PHOTOMASK SUBSTRATES |
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