SEMI P33 : 1998
Withdrawn
A Withdrawn Standard is one, which is removed from sale, and its unique number can no longer be used. The Standard can be withdrawn and not replaced, or it can be withdrawn and replaced by a Standard with a different number.
PROVISIONAL SPECIFICATION FOR DEVELOPMENT 230 MM SQUARE HARD SURFACE PHOTOMASK SUBSTRATES
01-07-2006
12-01-2013
Describes the dimensional requirements for nominally square hard surface photomask substrates of 230 mm nominal edge length, for research on and development of process and manufacturing equipment, pellicles, carriers, other accessory materials, and any related mask designs.
| DevelopmentNote |
Not available for sale from ILI, customer to contact SEMI. (05/2001)
|
| DocumentType |
Standard
|
| PublisherName |
Semiconductor Equipment & Materials Institute
|
| Status |
Withdrawn
|
| SEMI P23 : 2000(R2007) | GUIDELINE FOR PROGRAMMED DEFECT MASKS AND BENCHMARK PROCEDURES FOR SENSITIVITY ANALYSIS OF MASK DEFECT INSPECTION SYSTEMS |
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