Customer Support: +353 (0)1 857 6730

Corporate Website About Us
  • There are no items in your cart
Please enter a keyword to search
Advanced search
Home
SEMI
SEMI P33 : 1998

SEMI P33 : 1998

Withdrawn

Withdrawn

A Withdrawn Standard is one, which is removed from sale, and its unique number can no longer be used. The Standard can be withdrawn and not replaced, or it can be withdrawn and replaced by a Standard with a different number.

PROVISIONAL SPECIFICATION FOR DEVELOPMENT 230 MM SQUARE HARD SURFACE PHOTOMASK SUBSTRATES

Withdrawn date

01-07-2006

Published date

12-01-2013

Publisher

Semiconductor Equipment & Materials Institute

Describes the dimensional requirements for nominally square hard surface photomask substrates of 230 mm nominal edge length, for research on and development of process and manufacturing equipment, pellicles, carriers, other accessory materials, and any related mask designs.

DevelopmentNote
Not available for sale from ILI, customer to contact SEMI. (05/2001)
DocumentType
Standard
PublisherName
Semiconductor Equipment & Materials Institute
Status
Withdrawn

SEMI P23 : 2000(R2007) GUIDELINE FOR PROGRAMMED DEFECT MASKS AND BENCHMARK PROCEDURES FOR SENSITIVITY ANALYSIS OF MASK DEFECT INSPECTION SYSTEMS

View more information
Sorry this product is not available in your region.

Access your standards online with a subscription

Features

  • Simple online access to standards, technical information and regulations.

  • Critical updates of standards and customisable alerts and notifications.

  • Multi-user online standards collection: secure, flexible and cost effective.

Get in touch with us