SEMI P39 : 2016
Current
Current
The latest, up-to-date edition.
SPECIFICATION FOR OASIS - OPEN ARTWORK SYSTEM INTERCHANGE STANDARD
Published date
12-01-2013
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Specifies an interchange and encapsulation format for hierarchical integrated circuit mask layout information.
| DevelopmentNote |
Not available for sale from ILI, customer to contact SEMI (02/2004)
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| DocumentType |
Standard
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| PublisherName |
Semiconductor Equipment & Materials Institute
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| Status |
Current
|
| SEMI P10 : 2012 | SPECIFICATION OF DATA STRUCTURES FOR PHOTOMASK ORDERS |
| SEMI P45 : 2011 | SPECIFICATION FOR JOB DECK DATA FORMAT FOR MASK TOOLS |
| SEMI P44 : MAR 2016 | SPECIFICATION FOR OPEN ARTWORK SYSTEM INTERCHANGE STANDARD (OASIS [R]) SPECIFIC TO MASK TOOLS |
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