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SEMI P39 : 2016

SEMI P39 : 2016

Current

Current

The latest, up-to-date edition.

SPECIFICATION FOR OASIS - OPEN ARTWORK SYSTEM INTERCHANGE STANDARD

Published date

12-01-2013

Publisher

Semiconductor Equipment & Materials Institute

Specifies an interchange and encapsulation format for hierarchical integrated circuit mask layout information.

DevelopmentNote
Not available for sale from ILI, customer to contact SEMI (02/2004)
DocumentType
Standard
PublisherName
Semiconductor Equipment & Materials Institute
Status
Current

SEMI P10 : 2012 SPECIFICATION OF DATA STRUCTURES FOR PHOTOMASK ORDERS
SEMI P45 : 2011 SPECIFICATION FOR JOB DECK DATA FORMAT FOR MASK TOOLS
SEMI P44 : MAR 2016 SPECIFICATION FOR OPEN ARTWORK SYSTEM INTERCHANGE STANDARD (OASIS [R]) SPECIFIC TO MASK TOOLS

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