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SEMI P40 : 2009(R2016)

SEMI P40 : 2009(R2016)

Current

Current

The latest, up-to-date edition.

SPECIFICATION FOR MOUNTING REQUIREMENTS FOR EXTREME ULTRAVIOLET LITHOGRAPHY MASKS

Published date

12-01-2013

Publisher

Semiconductor Equipment & Materials Institute

Describes the mounting requirements for Extreme Ultraviolet Lithography (EUVL) masks in select tools. Also specifies the requirements for EUVL mask mounting.

DevelopmentNote
Not available for sale from ILI, customer to contact SEMI. (10/2003)
DocumentType
Standard
PublisherName
Semiconductor Equipment & Materials Institute
Status
Current

SEMI E152 : 2014 MECHANICAL SPECIFICATION OF EUV POD FOR 150 MM EUVL RETICLES

SEMI P37 : 2013 SPECIFICATION FOR EXTREME ULTRAVIOLET LITHOGRAPHY SUBSTRATES AND BLANKS

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