SEMI P40 : 2009(R2016)
Current
Current
The latest, up-to-date edition.
SPECIFICATION FOR MOUNTING REQUIREMENTS FOR EXTREME ULTRAVIOLET LITHOGRAPHY MASKS
Published date
12-01-2013
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Describes the mounting requirements for Extreme Ultraviolet Lithography (EUVL) masks in select tools. Also specifies the requirements for EUVL mask mounting.
| DevelopmentNote |
Not available for sale from ILI, customer to contact SEMI. (10/2003)
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| DocumentType |
Standard
|
| PublisherName |
Semiconductor Equipment & Materials Institute
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| Status |
Current
|
| SEMI E152 : 2014 | MECHANICAL SPECIFICATION OF EUV POD FOR 150 MM EUVL RETICLES |
| SEMI P37 : 2013 | SPECIFICATION FOR EXTREME ULTRAVIOLET LITHOGRAPHY SUBSTRATES AND BLANKS |
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