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SEMI E152 : 2014

SEMI E152 : 2014

Current

Current

The latest, up-to-date edition.

MECHANICAL SPECIFICATION OF EUV POD FOR 150 MM EUVL RETICLES

Published date

12-01-2013

Publisher

Semiconductor Equipment & Materials Institute

Describes EUV Pod for the 150 mm Extreme Ultraviolet Lithography (EUVL) reticle, used to ship, transport and store a 6-inch reticle. The EUV Pod consists of an outer pod and a protective inner pod. The EUV Pod is to be used when a conventional reticle carrier does not meet the requirements of EUVL.

DevelopmentNote
Not available for sale from ILI, customer to contact SEMI. (07/2009)
DocumentType
Standard
PublisherName
Semiconductor Equipment & Materials Institute
Status
Current

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