SEMI P46 : 2011
Current
Current
The latest, up-to-date edition.
SPECIFICATION FOR CRITICAL DIMENSION (CD) MEASUREMENT INFORMATION DATA ON PHOTOMASK BY XML
Published date
12-01-2013
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Specifies the common input/output information used for the critical dimension (CD) measurement tools for photomask.
| DevelopmentNote |
Not available for sale from ILI, customer to contact SEMI. (07/2006)
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| DocumentType |
Standard
|
| PublisherName |
Semiconductor Equipment & Materials Institute
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| Status |
Current
|
| SEMI P10 : 2012 | SPECIFICATION OF DATA STRUCTURES FOR PHOTOMASK ORDERS |
| SEMI P41 : 2004E | SPECIFICATION FOR MASK DEFECT DATA HANDLING WITH XML, BETWEEN DEFECT INSPECTION TOOLS, REPAIR TOOLS, AND REVIEW TOOLS |
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