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SEMI P46 : 2011

SEMI P46 : 2011

Current

Current

The latest, up-to-date edition.

SPECIFICATION FOR CRITICAL DIMENSION (CD) MEASUREMENT INFORMATION DATA ON PHOTOMASK BY XML

Published date

12-01-2013

Publisher

Semiconductor Equipment & Materials Institute

Specifies the common input/output information used for the critical dimension (CD) measurement tools for photomask.

DevelopmentNote
Not available for sale from ILI, customer to contact SEMI. (07/2006)
DocumentType
Standard
PublisherName
Semiconductor Equipment & Materials Institute
Status
Current

SEMI P10 : 2012 SPECIFICATION OF DATA STRUCTURES FOR PHOTOMASK ORDERS
SEMI P41 : 2004E SPECIFICATION FOR MASK DEFECT DATA HANDLING WITH XML, BETWEEN DEFECT INSPECTION TOOLS, REPAIR TOOLS, AND REVIEW TOOLS

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