SEMI P48 : 2010(R2016)
Current
Current
The latest, up-to-date edition.
SPECIFICATION OF FIDUCIAL MARKS FOR EUV MASK BLANK
Published date
12-01-2013
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Describes key requirements of fiducial marks that can be used as a coordinate system for referencing defect locations on EUV blanks.
| DevelopmentNote |
Not available for sale from ILI, customer to contact SEMI. (12/2010)
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| DocumentType |
Standard
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| PublisherName |
Semiconductor Equipment & Materials Institute
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| Status |
Current
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