SEMI P6 : 1988(R2007)
Current
Current
The latest, up-to-date edition.
SPECIFICATION FOR REGISTRATION MARKS FOR PHOTOMASKS
Published date
12-01-2013
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Covers a defined mark placed photolithographically on photomasks for the express purpose of determining the registration accuracy of one imaged photomask to another imaged photomask within the same set of photomasks.
| DevelopmentNote |
Not available for sale from ILI, customer to contact SEMI. (05/2001) Also available in CD-ROM. (06/2007)
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| DocumentType |
Standard
|
| PublisherName |
Semiconductor Equipment & Materials Institute
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| Status |
Current
|
| SEMI D26 : 2000 | PROVISIONAL SPECIFICATION FOR LARGE AREA MASKS FOR FLAT PANEL DISPLAYS (NORTH AMERICA) |
| SEMI P10 : 2012 | SPECIFICATION OF DATA STRUCTURES FOR PHOTOMASK ORDERS |
| BS IEC 62899-301-2:2017 | Printed electronics Equipment. Contact printing. Rigid master. Measurement method of plate master pattern dimension |
| SEMI P28 : 1996(R2007) | SPECIFICATION FOR OVERLAY-METROLOGY TEST PATTERNS FOR INTEGRATED-CIRCUIT MANUFACTURE |
| 14/30317965 DC : 0 | BS EN 62903-2 ED.1 - PRINTED ELECTRONICS - EQUIPMENT - CONTACT PRINTING - RIGID MASTER - PART 2: MEASUREMENT METHOD OF PLATE MASTER PATTERN DIMENSION |
| IEC 62899-301-2:2017 | Printed electronics - Part 301-2: Equipment - Contact printing - Rigid master - Measurement method of plate master pattern dimension |
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