• There are no items in your cart

SEMI T14.1 : 2005

Current

Current

The latest, up-to-date edition.

SPECIFICATION FOR THE MICRO ID OF SHORT VERTICAL DIMENSION ON 300 MM WAFER

Published date

12-01-2013

Describes a new means of identification with the Micro ID on 300 mm polished monocrystalline Silicon wafer with polished edge for process control.

DevelopmentNote
Not available for sale from ILI, customer to contact SEMI. (07/2005)
DocumentType
Standard
PublisherName
Semiconductor Equipment & Materials Institute
Status
Current

SEMI T14 : 2005 SPECIFICATION FOR MICRO ID ON 300 MM SILICON WAFERS

View more information
Sorry this product is not available in your region.

Access your standards online with a subscription

Features

  • Simple online access to standards, technical information and regulations.

  • Critical updates of standards and customisable alerts and notifications.

  • Multi-user online standards collection: secure, flexible and cost effective.