SEMI T14.1 : 2005
Current
Current
The latest, up-to-date edition.
SPECIFICATION FOR THE MICRO ID OF SHORT VERTICAL DIMENSION ON 300 MM WAFER
Published date
12-01-2013
Sorry this product is not available in your region.
Describes a new means of identification with the Micro ID on 300 mm polished monocrystalline Silicon wafer with polished edge for process control.
| DevelopmentNote |
Not available for sale from ILI, customer to contact SEMI. (07/2005)
|
| DocumentType |
Standard
|
| PublisherName |
Semiconductor Equipment & Materials Institute
|
| Status |
Current
|
| SEMI T14 : 2005 | SPECIFICATION FOR MICRO ID ON 300 MM SILICON WAFERS |
Access your standards online with a subscription
Features
-
Simple online access to standards, technical information and regulations.
-
Critical updates of standards and customisable alerts and notifications.
-
Multi-user online standards collection: secure, flexible and cost effective.