SEMI T16 : 2010(R2016)
Current
Current
The latest, up-to-date edition.
SPECIFICATION FOR USE OF DATA MATRIX SYMBOLOGY FOR AUTOMATED IDENTIFICATION OF EXTREME ULTRAVIOLET LITHOGRAPHY MASKS
Published date
12-01-2013
Sorry this product is not available in your region.
Describes the geometric and spatial relationships and content (including error checking and correcting code) of square two-dimensional, machine-readable, Data Matrix symbols for pattern-surface marking of resist-coated 6 inch EUV masks that comply with, or extrapolate from, the specifications of SEMI P37 and SEMI P38.
| DevelopmentNote |
Not available for sale from ILI, customer to contact SEMI. (10/2005)
|
| DocumentType |
Standard
|
| PublisherName |
Semiconductor Equipment & Materials Institute
|
| Status |
Current
|
| SEMI E152 : 2014 | MECHANICAL SPECIFICATION OF EUV POD FOR 150 MM EUVL RETICLES |
| SEMI P37 : 2013 | SPECIFICATION FOR EXTREME ULTRAVIOLET LITHOGRAPHY SUBSTRATES AND BLANKS |
| SEMI P38 : 2003 | SPECIFICATION FOR ABSORBING FILM STACKS AND MULTILAYERS ON EXTREME ULTRAVIOLET LITHOGRAPHY MASK BLANKS |
Access your standards online with a subscription
Features
-
Simple online access to standards, technical information and regulations.
-
Critical updates of standards and customisable alerts and notifications.
-
Multi-user online standards collection: secure, flexible and cost effective.