ASTM F 47 : 1994
Superseded
A superseded Standard is one, which is fully replaced by another Standard, which is a new edition of the same Standard.
Test Method for Crystalographic Perfection of Silicon by Preferential Etch Techniques (Withdrawn 1998)
31-12-1998
31-12-2010
CONTAINED IN VOL. 10.05 1997 Determines whether piece of silicon is monocrystalline in structure and if so, density of dislocations present. Swirls and striations may be delineated. Defects described to avoid confusion when counting dislocation etch pits.
DocumentType |
Test Method
|
PublisherName |
American Society for Testing and Materials
|
Status |
Superseded
|
ASTM F 1723 : 1996 | Standard Practice for Evaluation of Polycrystalline Silicon Rods by Float-Zone Crystal Growth and Spectroscopy |
ASTM F 76 : 2008 : R2016 | Standard Test Methods for Measuring Resistivity and Hall Coefficient and Determining Hall Mobility in Single-Crystal Semiconductors |
ASTM F 40 : 1983 | Method for Preparing Monocrystalline Test Ingots of Silicon by the Vertical-Pulling (Czochralski) Technique (Withdrawn 1988) |
MIL-STD-989 Base Document:1991 | CERTIFICATION REQUIREMENTS FOR JAN SEMICONDUCTOR DEVICES |
ASTM F 144 : 1980 : R2000 | Standard Practice for Making Reference Glass-Metal Sandwich Seal and Testing for Expansion Characteristics by Polarimetric Methods |
ASTM F 140 : 1998 : R2008 | Standard Practice for Making Reference Glass-Metal Butt Seals and Testing for Expansion Characteristics by Polarimetric Methods |
ASTM F 144 : 1980 : R1995 : EDT 1 | Standard Practice for Making Reference Glass-Metal Sandwich Seal and Testing for Expansion Characteristics by Polarimetric Methods |
ASTM F 144 : 1980 : R2010 | Standard Practice for Making Reference Glass-Metal Sandwich Seal and Testing for Expansion Characteristics by Polarimetric Methods |
ASTM F 140 : 1998 : R2013 | Standard Practice for<brk type="line"/> Making Reference Glass-Metal Butt Seals and Testing for Expansion Characteristics by Polarimetric Methods |
ASTM F 144 : 1980 : R2015 | Standard Practice for Making Reference Glass-Metal Sandwich Seal and Testing for Expansion Characteristics by Polarimetric Methods |
ASTM F 140 : 1998 | Standard Practice for Making Reference Glass-Metal Butt Seals and Testing for Expansion Characteristics by Polarimetric Methods |
ASTM F 144 : 1980 : R2005 | Standard Practice for Making Reference Glass-Metal Sandwich Seal and Testing for Expansion Characteristics by Polarimetric Methods |
ASTM F 140 : 1998 : R2003 | Standard Practice for Making Reference Glass-Metal Butt Seals and Testing for Expansion Characteristics by Polarimetric Methods |
ASTM F 850 : 1983 : R1988 | Test Method for Crystallographic Perfection of Gadolinium Gallium Garnet by Preferential Etch Techniques (Withdrawn 1992) |
UNE-EN 50513:2011 | Solar wafers - Data sheet and product information for crystalline silicon wafers for solar cell manufacturing |
ASTM F 1404 : 1992 : R1999 | Test Method for Crystallographic Perfection of Gallium Arsenide by Molten Potassium Hydroxide (KOH) Etch Technique |
ASTM F 1404 : 1992 : R2007 | Test Method for Crystallographic Perfection of Gallium Arsenide by Molten Potassium Hydroxide (KOH) Etch Technique (Withdrawn 2016) |
ASTM F 140 : 1998 : R2020 | Standard Practice for Making Reference Glass-Metal Butt Seals and Testing for Expansion Characteristics by Polarimetric Methods |
ASTM F 144 : 1980 : R2019 | Standard Practice for Making Reference Glass-Metal Sandwich Seal and Testing for Expansion Characteristics by Polarimetric Methods |
ASTM F 416 : 1994 | Test Method for Detection of Oxidation Induced Defects in Polished Silicon Wafers (Withdrawn 1998) |
ASTM F 76 : 2008 | Standard Test Methods for Measuring Resistivity and Hall Coefficient and Determining Hall Mobility in Single-Crystal Semiconductors |
ASTM F 76 : 2008 : R2016 : EDT 1 | Standard Test Methods for Measuring Resistivity and Hall Coefficient and Determining Hall Mobility in Single-Crystal Semiconductors (Withdrawn 2023) |
ASTM E 7 : 2017 : REDLINE | Standard Terminology Relating to Metallography |
ASTM F 416 : 1994 | Test Method for Detection of Oxidation Induced Defects in Polished Silicon Wafers (Withdrawn 1998) |
ANSI B74.10 : 2015 | GRADING OF ABRASIVE MICROGRITS |
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