BS EN 62047-26:2016
Current
The latest, up-to-date edition.
Semiconductor devices. Micro-electromechanical devices Description and measurement methods for micro trench and needle structures
Hardcopy , PDF
English
31-05-2016
Committee |
EPL/47
|
DevelopmentNote |
Supersedes 14/30294910 DC. (05/2016)
|
DocumentType |
Standard
|
Pages |
34
|
PublisherName |
British Standards Institution
|
Status |
Current
|
Supersedes |
IEC 62047-26:2016 specifies descriptions of trench structure and needle structure in a micrometer scale. In addition, it provides examples of measurement for the geometry of both structures. For trench structures, this standard applies to structures with a depth of 1 µm to 100 µm; walls and trenches with respective widths of 5 µm to 150 µm; and aspect ratio of 0,006 7 to 20. For needle structures, the standard applies to structures with three or four faces with a height, horizontal width and vertical width of 2 µm or larger, and with dimensions that fit inside a cube with sides of 100 µm. This standard is applicable to the structural design of MEMS and geometrical evaluation after MEMS processes.
Standards | Relationship |
EN 62047-26:2016 | Identical |
IEC 62047-26:2016 | Identical |
EN 60793-2-30:2009 | Identical |
ISO 3274:1996 | Geometrical Product Specifications (GPS) — Surface texture: Profile method — Nominal characteristics of contact (stylus) instruments |
ISO 129-1:2004 | Technical drawings Indication of dimensions and tolerances Part 1: General principles |
EN ISO 3274:1997 | Geometrical product specifications (GPS) - Surface texture: Profile method - Nominal characteristics of contact (stylus) instruments (ISO 3274:1996) |
ISO/IEC Guide 98-3:2008 | Uncertainty of measurement — Part 3: Guide to the expression of uncertainty in measurement (GUM:1995) |
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