
SEMI C3 : 2017
Current
Current
The latest, up-to-date edition.

SPECIFICATIONS FOR GASES
Published date
12-01-2013
Pertains to serve for gases to be used in the manufacture and processing of semiconductors and advanced electronic devices and circuits.
DevelopmentNote |
Not available for sale from ILI, customer to contact SEMI. (05/2001) Supersedes and includes SEMI C3.38. (02/2005)
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DocumentType |
Standard
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PublisherName |
Semiconductor Equipment & Materials Institute
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Status |
Current
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Supersedes |
SEMI C60 : 2017 | SPECIFICATION FOR NITROUS OXIDE |
SEMI C58 : 2016 | SPECIFICATION FOR HYDROGEN |
SEMI C3.31 : 2002 | PROVISIONAL STANDARD FOR DICHLOROSILANE (H2SICI2) IN CYLINDERS, 99% QUALITY |
SEMI C3.20 : 2014(R2019) | SPECIFICATION FOR HELIUM (HE), IN CYLINDERS, 99.9995% |
ASTM F 1723 : 1996 | Standard Practice for Evaluation of Polycrystalline Silicon Rods by Float-Zone Crystal Growth and Spectroscopy |
SEMI F51 : 2017 | GUIDE FOR ELASTOMERIC SEALING TECHNOLOGY |
SEMI C71 : 2015 | SPECIFICATION AND GUIDE FOR BORON TRICHLORIDE (BCI[3]) |
SEMI C59 : 2017 | SPECIFICATION FOR NITROGEN |
SEMI C3-2 : 2011(R2018) | SPECIFICATION FOR ARSINE (ASH[3]) IN CYLINDERS, 99.94% QUALITY |
SEMI C3.34 : 2016 | SPECIFICATION FOR DISILANE (SI[2]H[6]) IN CYLINDERS, 97% QUALITY |
SEMI C3.27 : 2002(R2018) | SPECIFICATION FOR BORON TRIFLUORIDE (BF[3]) IN CYLINDERS, 99.0% QUALITY |
SEMI C3.59 : 2002 | SPECIFICATIONS AND GUIDELINES FOR NITROGEN |
SEMI C3.12 : 2016 | SPECIFICATION FOR AMMONIA (NH[3]) IN CYLINDERS, 99.998% QUALITY |
SEMI C54 : 2016 | SPECIFICATION FOR OXYGEN |
SEMI C70 : 2016 | SPECIFICATION FOR TUNGSTEN HEXAFLUORIDE |
SEMI C3-6 : 2010(R2015) | SPECIFICATION FOR PHOSPHINE (PH3) IN CYLINDERS, 99.98% QUALITY |
SEMI C56 : 2016 | SPECIFICATION FOR DICHLOROSILANE |
SEMI C3 PT2 : *DUPLICATE RECORD* | **DUPLICATE RECORD** |
SEMI C57 : 2017 | SPECIFICATION FOR ARGON |
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