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SEMI C3 : 2017

Current

Current

The latest, up-to-date edition.

SPECIFICATIONS FOR GASES

Published date

12-01-2013

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Pertains to serve for gases to be used in the manufacture and processing of semiconductors and advanced electronic devices and circuits.

DevelopmentNote
Not available for sale from ILI, customer to contact SEMI. (05/2001) Supersedes and includes SEMI C3.38. (02/2005)
DocumentType
Standard
PublisherName
Semiconductor Equipment & Materials Institute
Status
Current
Supersedes

SEMI C60 : 2017 SPECIFICATION FOR NITROUS OXIDE
SEMI C58 : 2016 SPECIFICATION FOR HYDROGEN
SEMI C3.31 : 2002 PROVISIONAL STANDARD FOR DICHLOROSILANE (H2SICI2) IN CYLINDERS, 99% QUALITY
SEMI C3.20 : 2014(R2019) SPECIFICATION FOR HELIUM (HE), IN CYLINDERS, 99.9995%
ASTM F 1723 : 1996 Standard Practice for Evaluation of Polycrystalline Silicon Rods by Float-Zone Crystal Growth and Spectroscopy
SEMI F51 : 2017 GUIDE FOR ELASTOMERIC SEALING TECHNOLOGY
SEMI C71 : 2015 SPECIFICATION AND GUIDE FOR BORON TRICHLORIDE (BCI[3])
SEMI C59 : 2017 SPECIFICATION FOR NITROGEN
SEMI C3-2 : 2011(R2018) SPECIFICATION FOR ARSINE (ASH[3]) IN CYLINDERS, 99.94% QUALITY
SEMI C3.34 : 2016 SPECIFICATION FOR DISILANE (SI[2]H[6]) IN CYLINDERS, 97% QUALITY
SEMI C3.27 : 2002(R2018) SPECIFICATION FOR BORON TRIFLUORIDE (BF[3]) IN CYLINDERS, 99.0% QUALITY
SEMI C3.59 : 2002 SPECIFICATIONS AND GUIDELINES FOR NITROGEN
SEMI C3.12 : 2016 SPECIFICATION FOR AMMONIA (NH[3]) IN CYLINDERS, 99.998% QUALITY
SEMI C54 : 2016 SPECIFICATION FOR OXYGEN
SEMI C70 : 2016 SPECIFICATION FOR TUNGSTEN HEXAFLUORIDE
SEMI C3-6 : 2010(R2015) SPECIFICATION FOR PHOSPHINE (PH3) IN CYLINDERS, 99.98% QUALITY
SEMI C56 : 2016 SPECIFICATION FOR DICHLOROSILANE
SEMI C3 PT2 : *DUPLICATE RECORD* **DUPLICATE RECORD**
SEMI C57 : 2017 SPECIFICATION FOR ARGON

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