SEMI E109:2017(R2023)
Current
Current
The latest, up-to-date edition.
Specification for Reticle and Pod Management (RPMS)
Available format(s)
Hardcopy
Language(s)
English
Published date
01-06-2023
Important note : Users cannot be edited or removed once added to your Multi user PDF.This Specification provides standardized behavior for lithography, reticle inspection, and bare reticle stocker equipment.
| DocumentType |
Standard
|
| Pages |
0
|
| PublisherName |
Semiconductor Equipment & Materials Institute
|
| Status |
Current
|
| Supersedes |
| SEMI E30:2023 | Specification for the Generic Model for Communications and Control of Manufacturing Equipment (GEM) |
| SEMI E84 : 2009(R2017) | SPECIFICATION FOR ENHANCED CARRIER HANDOFF PARALLEL I/O INTERFACE |
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