SEMI E113 : 2006(R2018)
Superseded
Superseded
A superseded Standard is one, which is fully replaced by another Standard, which is a new edition of the same Standard.
View Superseded by
SPECIFICATION FOR SEMICONDUCTOR PROCESSING EQUIPMENT RF POWER DELIVERY SYSTEMS
Superseded date
24-08-2024
Superseded by
Published date
12-01-2013
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Process plasmas are used throughout the semiconductor industry for the etching and deposition of thin films. The majority of the process chambers use RF power to produce and sustain the plasmas.
| DevelopmentNote |
Not available for sale from ILI, customer to contact SEMI. (11/2001)
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| DocumentType |
Standard
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| PublisherName |
Semiconductor Equipment & Materials Institute
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| Status |
Superseded
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| SupersededBy |
| SEMI E78 : 2012 | GUIDE TO ASSESS AND CONTROL ELECTROSTATIC DISCHARGE (ESD) AND ELECTROSTATIC ATTRACTION (ESA) FOR EQUIPMENT |
| SEMI E10 : 2014E | SPECIFICATION FOR DEFINITION AND MEASUREMENT OF EQUIPMENT RELIABILITY, AVAILABILITY, AND MAINTAINABILITY (RAM) AND UTILIZATION |
| SEMI E114 : 2002E(R2016) | TEST METHOD FOR RF CABLE ASSEMBLIES USED IN SEMICONDUCTOR PROCESSING EQUIPMENT RF POWER DELIVERY SYSTEMS |
| SEMI E135 : 2004(R2012) | TEST METHOD FOR RF GENERATORS TO DETERMINE TRANSIENT RESPONSE FOR RF POWER DELIVERY SYSTEMS USED IN SEMICONDUCTOR PROCESSING EQUIPMENT |
| SEMI E115 : 2002E(R2016) | TEST METHOD FOR DETERMINING THE LOAD IMPEDANCE AND EFFICIENCY OF MATCHING NETWORKS USED IN SEMICONDUCTOR PROCESSING EQUIPMENT RF POWER DELIVERY SYSTEMS |
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