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SEMI M48 : 2001

SEMI M48 : 2001

Withdrawn

Withdrawn

A Withdrawn Standard is one, which is removed from sale, and its unique number can no longer be used. The Standard can be withdrawn and not replaced, or it can be withdrawn and replaced by a Standard with a different number.

GUIDE FOR EVALUATING CHEMICAL-MECHANICAL POLISHING PROCESSES OF FILMS ON UNPATTERNED SILICON SUBSTRATES

Withdrawn date

01-11-2010

Published date

12-01-2013

Publisher

Semiconductor Equipment & Materials Institute

Provides a guide for evaluation of chemical-mechanical polishing (CMP) processes of thin films on unpatterned silicon substrates and includes recommended procedures for process testing and reporting formats.

DevelopmentNote
Not available for sale from ILI, customer to contact SEMI. (11/2001)
DocumentType
Standard
PublisherName
Semiconductor Equipment & Materials Institute
Status
Withdrawn

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