SEMI M84 : 2014E
Current
The latest, up-to-date edition.
SPECIFICATIONS FOR POLISHED SINGLE CRYSTAL SILICON WAFERS FOR GALLIUM NITRIDE-ON-SILICON APPLICATIONS
06-05-2014
Provides ordering information and certain requirements for high-purity, single crystal polished silicon wafers used for gallium nitride-on-silicon applications. Specifications for dimensional characteristics and selected other properties are provided for three types of single crystal polished silicon wafers: - 150 mm flatted polished single crystal silicon wafers with secondary flat, - 150 mm flatted polished single crystal silicon wafers without secondary flat, and - 200 mm notched polished single crystal silicon wafers.
| DevelopmentNote |
Not available for sale from ILI, customer to contact SEMI. (04/2014) E = This standard was editorially modified in November 2017 to correct editorial errors. (01/2018)
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| DocumentType |
Standard
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| PublisherName |
Semiconductor Equipment & Materials Institute
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| Status |
Current
|
| SEMI M59 : 2014 | TERMINOLOGY FOR SILICON TECHNOLOGY |
| SEMI MF928 : 2017 | TEST METHOD FOR EDGE CONTOUR OF CIRCULAR SEMICONDUCTOR WAFERS AND RIGID DISK SUBSTRATES |
| SEMI T3 : 2013 | SPECIFICATION FOR WAFER BOX LABELS |
| SEMI M40 : 2014 | GUIDE FOR MEASUREMENT OF ROUGHNESS OF PLANAR SURFACES ON POLISHED WAFERS |
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