SEMI MF1049:2008(R2013)
Superseded
Superseded
A superseded Standard is one, which is fully replaced by another Standard, which is a new edition of the same Standard.
View Superseded by
PRACTICE FOR SHALLOW ETCH PIT DETECTION ON SILICON WAFERS
Superseded date
15-12-2023
Superseded by
Published date
08-11-2018
Sorry this product is not available in your region.
Specifies detect shallow etch pits that may be related to the level of metallic impurities near the surface of silicon epitaxial or polished wafers.
| DevelopmentNote |
Not available for sale from ILI, customer to contact SEMI. (11/2003) Also available in CD-ROM. (10/2007)
|
| DocumentType |
Standard
|
| PublisherName |
Semiconductor Equipment & Materials Institute
|
| Status |
Superseded
|
| SupersededBy |
| SEMI M1 : 2017 | SPECIFICATION FOR POLISHED SINGLE CRYSTAL SILICON WAFERS |
| SEMI C54 : 2016 | SPECIFICATION FOR OXYGEN |
| SEMI M59 : 2014 | TERMINOLOGY FOR SILICON TECHNOLOGY |
| SEMI M17 : 2010(R2015) | GUIDE FOR A UNIVERSAL WAFER GRID |
| SEMI C59 : 2017 | SPECIFICATION FOR NITROGEN |
| SEMI C28 : 2011 | SPECIFICATIONS FOR HYDROFLUORIC ACID |
Access your standards online with a subscription
Features
-
Simple online access to standards, technical information and regulations.
-
Critical updates of standards and customisable alerts and notifications.
-
Multi-user online standards collection: secure, flexible and cost effective.