SEMI P22 : 2007
Current
Current
The latest, up-to-date edition.
GUIDELINE FOR PHOTOMASK DEFECT CLASSIFICATION AND SIZE DEFINITION
Published date
12-01-2013
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Provides guideline to establish standard nomenclature for photomask defect classifications, and to define defect sizing methods.
| DevelopmentNote |
Not available for sale from ILI, customer to contact SEMI. (05/2001) Also available in CD-ROM. (02/2007)
|
| DocumentType |
Standard
|
| PublisherName |
Semiconductor Equipment & Materials Institute
|
| Status |
Current
|
| SEMI P29 : 2011 | SPECIFICATION FOR CHARACTERISTICS SPECIFIC TO ATTENUATED PHASE SHIFT MASKS AND MASKS BLANKS |
| SEMI P10 : 2012 | SPECIFICATION OF DATA STRUCTURES FOR PHOTOMASK ORDERS |
| SEMI P43 : 2004(R2011) | PHOTOMASK QUALIFICATION TERMINOLOGY |
| SEMI P23 : 2000(R2007) | GUIDELINE FOR PROGRAMMED DEFECT MASKS AND BENCHMARK PROCEDURES FOR SENSITIVITY ANALYSIS OF MASK DEFECT INSPECTION SYSTEMS |
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