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SEMI P38 : 2003

SEMI P38 : 2003

Withdrawn

Withdrawn

A Withdrawn Standard is one, which is removed from sale, and its unique number can no longer be used. The Standard can be withdrawn and not replaced, or it can be withdrawn and replaced by a Standard with a different number.

SPECIFICATION FOR ABSORBING FILM STACKS AND MULTILAYERS ON EXTREME ULTRAVIOLET LITHOGRAPHY MASK BLANKS

Withdrawn date

01-07-2010

Published date

12-01-2013

Publisher

Semiconductor Equipment & Materials Institute

Gives the requirements of the multilayer coating and of the absorbing film stack on Extreme Ultraviolet Lithography (EUVL) masks. This standard details the physical characteristics and tolerances required for EUVL mask multilayer coatings.

DevelopmentNote
Not available for sale from ILI, customer to contact SEMI. (10/2003)
DocumentType
Standard
PublisherName
Semiconductor Equipment & Materials Institute
Status
Withdrawn

SEMI T16 : 2010(R2016) SPECIFICATION FOR USE OF DATA MATRIX SYMBOLOGY FOR AUTOMATED IDENTIFICATION OF EXTREME ULTRAVIOLET LITHOGRAPHY MASKS
SEMI P10 : 2012 SPECIFICATION OF DATA STRUCTURES FOR PHOTOMASK ORDERS
SEMI E152 : 2014 MECHANICAL SPECIFICATION OF EUV POD FOR 150 MM EUVL RETICLES

SEMI P37 : 2013 SPECIFICATION FOR EXTREME ULTRAVIOLET LITHOGRAPHY SUBSTRATES AND BLANKS

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