SEMI P38 : 2003
Withdrawn
A Withdrawn Standard is one, which is removed from sale, and its unique number can no longer be used. The Standard can be withdrawn and not replaced, or it can be withdrawn and replaced by a Standard with a different number.
SPECIFICATION FOR ABSORBING FILM STACKS AND MULTILAYERS ON EXTREME ULTRAVIOLET LITHOGRAPHY MASK BLANKS
01-07-2010
12-01-2013
Gives the requirements of the multilayer coating and of the absorbing film stack on Extreme Ultraviolet Lithography (EUVL) masks. This standard details the physical characteristics and tolerances required for EUVL mask multilayer coatings.
| DevelopmentNote |
Not available for sale from ILI, customer to contact SEMI. (10/2003)
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| DocumentType |
Standard
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| PublisherName |
Semiconductor Equipment & Materials Institute
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| Status |
Withdrawn
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| SEMI T16 : 2010(R2016) | SPECIFICATION FOR USE OF DATA MATRIX SYMBOLOGY FOR AUTOMATED IDENTIFICATION OF EXTREME ULTRAVIOLET LITHOGRAPHY MASKS |
| SEMI P10 : 2012 | SPECIFICATION OF DATA STRUCTURES FOR PHOTOMASK ORDERS |
| SEMI E152 : 2014 | MECHANICAL SPECIFICATION OF EUV POD FOR 150 MM EUVL RETICLES |
| SEMI P37 : 2013 | SPECIFICATION FOR EXTREME ULTRAVIOLET LITHOGRAPHY SUBSTRATES AND BLANKS |
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