ASTM F 120 : 1988
Withdrawn
A Withdrawn Standard is one, which is removed from sale, and its unique number can no longer be used. The Standard can be withdrawn and not replaced, or it can be withdrawn and replaced by a Standard with a different number.
Practices for Determination of the Concentration of Impurities in Single Crystal Semiconductor Materials by Infrared Absorption Spectroscopy (Withdrawn 1993)
31-12-1993
31-12-2010
CONTAINED IN VOL 10.05 1996 Determines concentration of impurities in semiconductor materials using either simple or computer assisted dispersive or Fourier transform infrared spectrophotometers. Concentration determined from intensity of infrared absorption bands characteristic of impurities. Impurity content can be determined, if transparent and has absorption bands in infrared region of spectrum.
| DocumentType |
Standard Practice
|
| PublisherName |
American Society for Testing and Materials
|
| Status |
Withdrawn
|
| MIL-STD-989 Base Document:1991 | CERTIFICATION REQUIREMENTS FOR JAN SEMICONDUCTOR DEVICES |
| ASTM F 121 : 1983 : EDT 1 | Test Method for Interstitial Atomic Oxygen Content of Silicon by Infrared Absorption (Withdrawn 1989) |
| ASTM F 122 : 1974 : R1985 | Test Method for Interstitial Atomic Oxygen Content of Silicon by Infrared Absorption (Withdrawn 1990) |
| ASTM F 122 : 1974 : R1985 | Test Method for Interstitial Atomic Oxygen Content of Silicon by Infrared Absorption (Withdrawn 1990) |
| ASTM F 121 : 1983 : EDT 1 | Test Method for Interstitial Atomic Oxygen Content of Silicon by Infrared Absorption (Withdrawn 1989) |
| ASTM E 168 : 2016 | Standard Practices for General Techniques of Infrared Quantitative Analysis |
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