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  • ASTM F 120 : 1988

    Withdrawn A Withdrawn Standard is one, which is removed from sale, and its unique number can no longer be used. The Standard can be withdrawn and not replaced, or it can be withdrawn and replaced by a Standard with a different number.

    Practices for Determination of the Concentration of Impurities in Single Crystal Semiconductor Materials by Infrared Absorption Spectroscopy (Withdrawn 1993)

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    Withdrawn date:  31-12-1993

    Language(s): 

    Published date:  31-12-2010

    Publisher:  American Society for Testing and Materials

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    Abstract - (Show below) - (Hide below)

    CONTAINED IN VOL 10.05 1996 Determines concentration of impurities in semiconductor materials using either simple or computer assisted dispersive or Fourier transform infrared spectrophotometers. Concentration determined from intensity of infrared absorption bands characteristic of impurities. Impurity content can be determined, if transparent and has absorption bands in infrared region of spectrum.

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    Document Type Standard Practice
    Publisher American Society for Testing and Materials
    Status Withdrawn

    Standards Referenced By This Book - (Show below) - (Hide below)

    MIL-STD-989 Base Document:1991 CERTIFICATION REQUIREMENTS FOR JAN SEMICONDUCTOR DEVICES
    ASTM F 121 : 1983 : EDT 1 Test Method for Interstitial Atomic Oxygen Content of Silicon by Infrared Absorption (Withdrawn 1989)
    ASTM F 122 : 1974 : R1985 Test Method for Interstitial Atomic Oxygen Content of Silicon by Infrared Absorption (Withdrawn 1990)

    Standards Referencing This Book - (Show below) - (Hide below)

    ASTM F 122 : 1974 : R1985 Test Method for Interstitial Atomic Oxygen Content of Silicon by Infrared Absorption (Withdrawn 1990)
    ASTM F 121 : 1983 : EDT 1 Test Method for Interstitial Atomic Oxygen Content of Silicon by Infrared Absorption (Withdrawn 1989)
    ASTM E 168 : 2016 Standard Practices for General Techniques of Infrared Quantitative Analysis
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